Magnetron & Electron Beam Integrated Research Platform
Advanced research platform integrating sputtering and evaporation
System Overview
The HN-MS-EB-R-010 integrates magnetron sputtering and electron beam evaporation in a single high-vacuum research chamber. Designed for university laboratories, materials research institutes, and semiconductor research centers, the system supports thin-film research activities ranging from optical multilayer development to semiconductor device heterostructures.
Working Principle
A shared high-vacuum environment with independent magnetron sputtering and e-beam evaporation sources allows researchers to leverage the strengths of each technique within a single experiment. Sputtering excels at reactive deposition of stoichiometrically controlled compounds; evaporation delivers low-defect, high-purity films of refractory materials and compound semiconductors. Sequential and co-deposition modes are supported.
Core Advantages
- Broadest material and process coverage in a single research system
- High-vacuum design suitable for device-quality film research
- Independent control of all source, substrate, and atmosphere parameters
- Multiple in-situ diagnostic integration ports
- Sequential and co-deposition capability
- Supports both wafer-scale and coupon substrates
- Advanced data acquisition and logging for research publication quality
Technical Specifications
| Chamber | φ600 mm partitioned research chamber |
|---|---|
| Standard Sources | 3 DC/RF magnetron targets and one 4-crucible electron-beam gun |
| Vacuum System | Independent zoned pumping with dual vacuum valve sets |
| Control | Open process programming with local storage for more than 1,000 experiment recipes |
| Data System | Automatic process-data storage and Origin-compatible curve export |
| Integration | Reserved rapid vacuum sampling port for SEM/AFM integration |
Specifications are representative. Final system parameters are defined during configuration. Contact our engineering team for detailed documentation.
