
Pure Multi-arc Ion Plating Equipment
High-throughput arc ion plating for industrial production
Customized multi-arc ion plating, magnetron sputtering, electron beam evaporation, and composite PVD platforms — engineered by HUANING ZHIKE for demanding production and laboratory environments worldwide.
Whether you operate high-volume production lines or cutting-edge research laboratories, HUANING ZHIKE provides the right PVD system architecture.
From compact laboratory platforms to full-scale industrial production equipment — every HUANING ZHIKE system is configurable to your process requirements.

High-throughput arc ion plating for industrial production

High-uniformity sputtering for optical and functional films

Combine arc and sputtering in one integrated production platform

High-purity evaporation for precision optical and semiconductor films

Unified sputtering and evaporation for advanced multilayer architectures

Compact arc plating platform for process development and small batches

Precision research sputtering with full parameter accessibility

Research-scale composite platform for multilayer coating studies

Compact high-purity evaporation for optical and device research

Advanced research platform integrating sputtering and evaporation
Each deposition method carries distinct physical mechanisms, process windows, and film property profiles. HUANING ZHIKE systems span the full range of industrial and research PVD techniques.
Sustains arc discharges on metallic cathodes to generate highly ionized plasma. High deposition rate, excellent film adhesion, and superior coating density make this the dominant method for industrial hard coating and decorative PVD production.
Plasma confined by crossed electric and magnetic fields enables high-rate sputtering of metallic, ceramic, and compound targets. DC, RF, and pulsed-DC power modes, and reactive atmosphere capability, support deposition of nitrides, oxides, and functional films.
A focused, magnetically deflected electron beam heats and evaporates source materials in a cooled copper hearth. Preferred for high-purity optical and semiconductor thin-film deposition of refractory metals and dielectric oxides.
Dual-technology chambers integrate two deposition methods — arc + sputtering or sputtering + e-beam — within a single vacuum enclosure. Sequential or simultaneous operation enables multilayer coating architectures, graded interfaces, and DLC composite structures without air breaks.
HUANING ZHIKE systems and process knowledge span the key application domains of industrial PVD coating.
HUANING ZHIKE integrates system engineering, precision manufacturing, process validation, and equipment testing under one roof.
Every HUANING ZHIKE system follows a structured engineering process from first contact through to on-site commissioning and process support.
Our engineers review your substrate geometry, coating specification, production volumes, and facility constraints to define system requirements.
Chamber dimensions, deposition source configuration, target layout, pumping stack, controls architecture, and options are specified and documented.
When applicable, representative workpieces are coated in our Class 10,000 R&D laboratory to validate the process before system build.
Vacuum chambers, mechanical assemblies, electrical systems, and control panels are fabricated and assembled across our six dedicated production lines.
Completed systems undergo full vacuum performance, electrical safety, process parameter, and recipe verification in our controlled inspection facility.
On-site installation, commissioning, operator training, and ongoing process support are provided by our technical team.
Contact our engineering team with your application, substrate, coating specification, and production requirements. We will respond with equipment recommendations and a preliminary system proposal.