Small Multi-arc Ion Plating R&D Equipment
Compact arc plating platform for process development and small batches
System Overview
The HN-MA-R-006 is a laboratory-scale multi-arc ion plating system designed for process research, coating development, and small-batch production in university laboratories, research institutes, and industrial R&D centers. Its compact footprint and accessible chamber design enable rapid iteration of arc plating processes at a scale appropriate for coupon-level and small-component coating studies.
Working Principle
Identical deposition physics to the industrial HN-MA-001, scaled to a laboratory chamber volume. Arc sources generate highly ionized metal plasma for adherent, dense coating deposition. The simplified mechanical layout and accessible chamber promote efficient process development workflows.
Core Advantages
- Compact footprint suitable for laboratory environments
- Accessible chamber design for rapid target and fixture changes
- Scalable process parameters transferable to industrial systems
- Independent arc source control for process optimization
- Substrate bias control for film property studies
- Integrated heating for substrate temperature studies
- Suitable for coupon, small component, and sample plate coating
Technical Specifications
| Chamber | φ300/450 mm compact vertical chamber |
|---|---|
| Arc Cathodes | 2–4 compact arc cathodes |
| Bias System | Programmable segmented DC / pulsed bias |
| Temperature Control | Programmable stepped heating |
| Sample Fixture | Compact multi-position planetary holder for up to 20 comparison samples |
| Data System | Automatic recording of vacuum, power, gas flow, and temperature with Excel export |
Specifications are representative. Final system parameters are defined during configuration. Contact our engineering team for detailed documentation.
